Photofabrication

Overview

This technology forms fine patterns using photosensitive material through exposure and development. It can be used for semiconductors, electronic components, and fine metal parts.

Features

Mask exposure

Maskless exposure machine

No masks are required, so prototypes can be produced in a short time.

Compatible with a variety of substrate materials

Specification

Processing size

Mask exposure: 320 x 320 mm
Maskless exposure: 300 x 400 mm

Exposure wavelength

Mask exposure: Broad wavelength maskless exposure: 375 nm

L/S

3μm/3μm～

Field

In Vehicle Semiconductor Mobile MEMS FA

Appolocation

High Frequency Device Electronic Devices Automotive Components Semiconductor Glass Core Medical Devices Mobile Componets MEMS

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